Nanoimprint Lithography Pioneers
Since 2002, our company has developed robust nanoimprint hardware, materials and processes for a wide array of markets including Semiconductors, Displays, Optics and Photonics, Data Storage, Biomedical Devices, Security and Anti-Counterfeiting, MEMS, LEDs, Advanced Packaging, Reticle and Wafer Replication, and Adaptive Planarization.
WE ARE A CREATIVE RESEARCH AND DEVELOPMENT ARM OF CANON
Our R&D team actively publish in leading technical journals, present at major industry conferences, and contribute to a robust portfolio of intellectual property across a wide range of nanoimprint lithography applications.OUR TECHNOLOGY
Our Products
Our core products are designed for 300mm silicon wafer processing, capable of patterning features down to sub-10nm dimensions. Engineered for low defectivity, high throughput, and reliable production performance, our tools support advanced manufacturing needs. We service and support a global base of installed systems and users.PRODUCTS
Mask Replication
sub 10nm Lithography
Adaptive Inkjet Planarization
About us
Canon Nanotechnologies is a leading developer of advanced nanoimprint lithography systems for semiconductor and high-resolution patterning applications based in Austin, Texas
Our LEADERSHIP
Our executive team is built on deep roots in the semiconductor industry, with decades of experience driving innovation. We’re committed to helping our customers achieve their goals with trusted expertise and industry-proven solutions.